An optical diffuse reflectance model for the characterization of a si wafer with an evaporated SiO2 layer

dc.contributor.author	Zarzycki A.
dc.contributor.author	Galeano J.
dc.contributor.author	Bargiel S.
dc.contributor.author	Andrieux A.
dc.contributor.author	Gorecki C.
dc.date.accessioned	2020-08-28T22:27:38Z
dc.date.available	2020-08-28T22:27:38Z
dc.date.issued	2019
dc.identifier.uri	http://hdl.handle.net/20.500.12622/3173
dc.source	Scopus
dc.source.uri	https://www.scopus.com/inward/record.uri?eid=2-s2.0-85062031528&doi=10.3390%2fs19040892&partnerID=40&md5=e6d9e2fde60b6f44c35d4915a112b123
dc.title	An optical diffuse reflectance model for the characterization of a si wafer with an evaporated SiO2 layer	spa
dc.title.alternative	Sensors (Switzerland)
dc.type	info:eu-repo/semantics/article
dc.rights.accessrights	info:eu-repo/semantics/closedAccess
dc.relation.citationissue	4	spa
dc.identifier.doi	10.3390/s19040892
dc.relation.citationvolume	19
dc.description.edition	892
dc.type.version	info:eu-repo/semantics/publishedVersion

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