An optical diffuse reflectance model for the characterization of a si wafer with an evaporated SiO2 layer

Date

2019

Author

Zarzycki A.

Galeano J.

Bargiel S.

Andrieux A.

Gorecki C.

Metadata

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Source

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85062031528&doi=10.3390%2fs19040892&partnerID=40&md5=e6d9e2fde60b6f44c35d4915a112b123

URI

http://hdl.handle.net/20.500.12622/3173

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Artículos [930]