An optical diffuse reflectance model for the characterization of a si wafer with an evaporated SiO2 layer

Share this

Date

2019

Author

Zarzycki A.

Galeano J.

Bargiel S.

Andrieux A.

Gorecki C.

Metadata

Show full item record

Source

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85062031528&doi=10.3390%2fs19040892&partnerID=40&md5=e6d9e2fde60b6f44c35d4915a112b123

URI

http://hdl.handle.net/20.500.12622/3173

Collections

• Artículos [930]