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Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
dc.contributor.author | Jaramillo J. | |
dc.contributor.author | Zarzycki A. | |
dc.contributor.author | Galeano J. | |
dc.contributor.author | Sandoz P. | |
dc.date.accessioned | 2020-08-28T22:28:08Z | |
dc.date.available | 2020-08-28T22:28:08Z | |
dc.date.issued | 2017 | |
dc.identifier.uri | http://hdl.handle.net/20.500.12622/3479 | |
dc.source | Scopus | |
dc.source.uri | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85011662546&doi=10.3390%2fs17020278&partnerID=40&md5=5096edbe32fc296b8b8268928bae6caf | |
dc.title | Performance characterization of an xy-stage applied to micrometric laser direct writing lithography | spa |
dc.title.alternative | Sensors (Switzerland) | |
dc.type | info:eu-repo/semantics/article | |
dc.rights.accessrights | info:eu-repo/semantics/closedAccess | |
dc.relation.citationissue | 2 | spa |
dc.identifier.doi | 10.3390/s17020278 | |
dc.relation.citationvolume | 17 | |
dc.description.edition | 278 | |
dc.type.version | info:eu-repo/semantics/publishedVersion |
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